Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Praha 8, Czech Republic.
An overview of the used X-ray optics will be presented. The working principles of the wide range of used optics will be discussed. The use of laboratory sources, synchrotron sources and the latest free electron sources require new performance benchmarks for manufacturers. Various obstacles have to be overcome in order not the downgrade the excellent features of new home lab sources and free electron sources. In EUV lithography new challenges for optics performance arises with the use of the 13.6 eV line and the forecast for the 6.x and lower emission lines.