CHARACTERISTICS OF DUERR IMAGING PLATE OPG

 

Z. Pala1, N. Ganev1, K. Kolařík1

 

1Department of Solid State Engineering, Faculty of Nuclear Sciences and Physical Engineering, Czech Technical University in Prague, Trojanova 13, 120 00 Prague 2, Czech Republic

 

Keywords

Imaging plate, density of blackening, linearity, photographic film, backscattering

 

Introduction

 

The goal of this study is to provide a relation between density of blackening and exposure for Duerr Imaging Plate OPG, which is used as a position sensitive detector in XRD laboratory of Department of Solid State Engineering. Comparison between photographic film and imaging plate from the point of view of linearity was performed. Backscattering Debye – Scherrer experiment with Ag standard was carried out in order to gain diffraction pattern on imaging plate. Dependences of background, absolute and relative peak height versus exposure time for two wavelengths of X-ray radiation were evaluated.

 

Density of blackening

 

Absorption of photon in the sensitive layer of silver bromide leads to formation of photographic latent image. The unexposed crystallites of silver bromide are removed in the fixing bath. Density of blackening D can be expressed as

D = log I0/I,                             (1.1)

 

where I0 is the intensity of incident light and I is the intensity of light that passed through a developed and fixed photographic film. Density D may be expressed as a function of exposure time t and intensity of incident X-ray beam IX. Hence the characteristics of film is given by D = f (IX*t), the maximum value of D where D is linear function of IX*t varies from 0.5 to 2.5 [1].

Sensitive layer in imaging plate comprises of luminofore barium chromo-bromide, which is excited by incident photon into a semi-stable state. By an illumination with He-Ne laser the process of photostimulated luminiscence is triggered and the image in form of 16-bit grayscale pattern is released. Now I0 in eq. (1.1) is the maximum value on grayscale 216 = 65536 and I is the information in the chosen pixel. It can be still assumed that D is function of exposure time t and intensity of incident X-ray beam IX.

 

Experiment

 

The backscattering diffraction experiment was done using CuKa and CrKa radiation, the exposure times varied from 1 to 20 minutes for copper anode and from 1 to 55 minutes for chrome anode. The plate holder was rotated at 1 rpm in order to avoid effects of coarse grain of the standard Ag. The incident beam impinged the sample in direction normal to its surface. The 16-bit diffraction pattern on the imaging plate was obtained by scanning on VistaScan by Duerr. Lucia 5.10 image analysis system was used to gain intensity profile, which was transformed into density profile employing eq. (1.1).

 

Evaluation of profiles

 

In Fig. 1 density profile is depicted, dependences of following parameters on exposure time were investigated:  absolute and relative diffraction peak height, integration intensity, FWHM and level of background. The peaks were approximated by Gaussian function D = a + b*exp(-0,5((p-c)/d)2),where p is position in pixels, and background by two linear functions D = K1p+Q1, D = K2p+Q2. Value Dlin as a maximum density, where linear relation between D and t is observed, was figured out for both wavelengths.

 

 

Conclusions

 

Following statements can be derived from computed characteristics of imaging plate:

 

(i)                  Value Dlin = 0.3 was established. That corresponds to the intensity range (34000, I0) in 16-bit image.

(ii)                Photographic films exhibit effect of solarization for D > Dlin, when the level of blackening declines by big exposures. Whereas imaging plate display higher values of density for D > Dlin than would correspond to linear evolution as can be seen in Fig. 2.

(iii)               If the absolute peak height is less than Dlin, the plots Iint (t), b (t) are linear. For  D > Dlin deviations from linearity occur.

(iv)              No obvious relation between FWHM and exposure was found.

 

References

 

1.         Kraus I., Ganev N.: Technické aplikace difrakční analýzy. Praha 2004. Vydavatelství ČVUT.

2.         Giacovazzo C., et al.: Fundamentals of Crystallography. Second edition. Oxford University Press 2002.