Substrate-Controlled Crystallization and Crystal Orientation of HMTP Organic Semiconductor Thin Films on Graphene/SiC

Devanshu Varshney,1 Pavel Procházka,2 Veronika Stará,2 Mykhailo Shestopalov,3 Jan Kunc3, Jan Čechal2,4 , Jiří Novák1

1Department of Condensed Matter Physics, Faculty of Science, Masaryk University, Kotlářská 2, 61137 Brno, Czech Republic 

2CEITEC - Central European Institute of Technology, Brno University of Technology, Purkyňova 123, 612 00 Brno, Czech Republic.  

3Charles University, Faculty of Mathematics and Physics, Institute of Physics, Ke Karlovu 5, 121 16, Prague 2, Czech   Republic 

4Institute of Physical Engineering, Brno University of Technology, Technická 2896/2, 616 69 Brno, Czech Republic. 

 

We investigate thin films of the π-conjugated electron-donor organic semiconductor molecule 2,3,6,7,10,11-hexamethoxytriphenylene (HMTP) on two structurally similar surfaces: single-layer graphene (SLG) on SiC(0001) and the buffer layer on SiC(0001) [1]. Epitaxial graphene on SiC consists of an sp²-hybridized single-layer graphene above a carbon buffer layer. Although the buffer layer retains a graphene-like lattice, it is partially sp³-bonded to the underlying Si atoms of the SiC substrate, creating a locally inhomogeneous surface at the nanoscale [2]. In this talk, I will show how these two structurally similar surfaces control both the crystallization and the crystal orientation of HMTP organic semiconductor thin films from the earliest stages of growth.

We combine low-energy electron microscopy and diffraction (LEEM/LEED), which probe the initial growth, with a set of X-ray diffraction techniques —  pole figure measurements, azimuthal scans, symmetric ω/2θ scans, and rocking curve measurements —  to characterize the crystallographic texture and crystal quality of films up to approximately 30 nm thickness on both surfaces. On SLG, pole figures measured for HMTP { reflections reveal two sets of six sharp diffraction spots, confirming highly ordered epitaxial growth with two mirror domains rotated by ±19.1° relative to the graphene lattice (fig.1(a)). Azimuthal scans show narrow peaks with a full width at half maximum of 0.5°, close to the instrumental resolution, demonstrating exceptional in-plane orientational order. Symmetric scans further reveal that the HMTP { lattice planes are parallel to the sample surface, while the presence of Laue oscillations confirms uniform film thickness and high crystalline coherence.

In contrast, HMTP films grown on the buffer layer exhibit a ring-shaped band of enhanced intensity with slight azimuthal modulation in the pole figure measured for the HMTP { reflections (fig.1(b)). The corresponding azimuthal scans show maxima that are approximately 20 times weaker and significantly broader than those observed on SLG, accompanied by a higher continuous intensity profile between the maxima. This indicates a large fraction of randomly oriented crystalline domains. During the initial growth stages, HMTP grows amorphously; however, with increasing film thickness, it evolves into a polycrystalline film with only weak orientational order with respect to the substrate. Furthermore, symmetric scans show that the HMTP { lattice planes are parallel to the sample surface, as observed for HMTP on SLG. However, the absence of Laue oscillations and the lower peak intensity signify reduced crystalline quality.

Finally, we decouple the buffer layer via hydrogen intercalation, which breaks the Si–C bonds and converts the buffer layer into quasi-freestanding graphene [3]. Subsequent growth of HMTP on this surface leads to epitaxial films, demonstrating that the unevenly distributed covalent Si–C bonding between the buffer layer and the SiC substrate is the decisive factor limiting organic semiconductor thin-film crystallinity on graphene/SiC.

 

Figure 1:  XRD pole figures of the HMTP { reflections measured for the fims grown on SLG (a) and on the buffer layer (b). The sharp diffraction spots in (a) and the ring-shaped band of enhanced intensity in (b), indicated by the arrow, are both located at a polar angle of 31.7° with respect to the HMTP [0001] direction.

 

[1] Varshney, D.; Procházka, P.; Stará, V.; et al. Interfacial Coupling Controls Molecular Epitaxy of HMTP on Graphene/SiC. ACS Applied Materials & Interfaces 2026.[Unknown A1] 

[2] Backes, C.; Abdelkader, A. M.; Alonso, C.; et al. Production and Processing of Graphene and Related Materials. 2D Mater. 2020, 7, 022001.

[3] Kunc, J.; Rejhon, M.; Hlídek, P.; et al. Hydrogen Intercalation of Epitaxial Graphene and Buffer Layer Probed by Mid-Infrared Absorption and Raman Spectroscopy. AIP Adv. 2018, 8, 045015.

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 


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